High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

• Jorge Trasobares,
• François Vaurette,
• Marc François,
• Hans Romijn,
• Jean-Louis Codron,
• Dominique Vuillaume,
• Didier Théron and
• Nicolas Clément

Beilstein J. Nanotechnol. 2014, 5, 1918–1925, doi:10.3762/bjnano.5.202

• . By comparing the four different techniques, we evidence the limiting parameters for the writing speed. Wafer-scale fabrication of such arrays with 50 nm pitch allowed XPS analysis of a ferrocenylalkyl thiol self-assembled monolayer coated gold nanoarray. Keywords: gold nanodot; gold nanoparticle

• pattern, the stage moves from one main field to the other one. b) Schematic description of the 4 e-beam lithography techniques compared for their writing sequence inside a main field and their layout (BSS is the beam step size). Scanning electron microscope (SEM) images of the gold nanodot arrays